MIRA represents a breakthrough in electron microscopy, featuring an exceptionally large vacuum chamber that enables non-destructive analysis of complete components and large specimens.
This revolutionary design allows for in-situ testing and avoids destructive sample preparation, preserving valuable components while delivering advanced analytical capabilities across various industries.
Accommodates samples up to 1500mm in diameter and 1500mm in height, enabling analysis of large components.
Advanced electron optics deliver better than 10nm resolution for detailed analysis of microstructures.
Integrates EDS, EBSD, and optionally FIB & FT-IR for comprehensive material characterization.
Feature | Specification |
---|---|
Resolution | Better than 10nm |
Magnification | 10x - 300,000x |
Acceleration Voltage | 0.2 - 30keV |
Detectors | Channeltron (SE), 4-Quadrant (BSE) |
Maximum Specimen Size | Up to 1500 mm diameter, 1500 mm height |
Maximum Specimen Mass | 300 kg |
Axes | 5+1 axis system with micro-step control |
Repetition Accuracy | ±50 μm |
Positioning Range (X) | 600mm, 1000mm, 1500mm options |
Positioning Range (Z) | 600mm, 1000mm, 1500mm options |
Positioning Range (A) | 90° |
Positioning Range (B) | 135° |
Positioning Range (C) | 360° |
Positioning Range (D) | 350° |
Standard Analytical | EDS (Energy Dispersive X-Ray Spectroscopy), EBSD (Electron Backscatter Diffraction) |
Optional Capabilities | FIB (Focus Ion Beam), FT-IR (Fourier Transformed Infrared Spectrometer), Internal Camera System |
Software | MIRA Control System (Windows® based) |
Hardware | PC, monitors, Printer |
Low Vacuum Pumps | Rotary vane (65m³/h), Rotary lobe (400 m³/h) |
High Vacuum Pump | Turbo pump 2400 l/sec |
Ultimate Vacuum | Up to 10⁻⁶ mbar (achieved after ~45 minutes) |
Vacuum Chamber Size Options | 3m³, 9m³, 12m³ |
MIRA enables comprehensive analysis of satellite components, propulsion systems, and thermal protection materials without compromising their structural integrity.
MIRA provides defense contractors with unparalleled capabilities for analyzing armor materials, weapon systems, and electronic components while maintaining security.
Founded by Martin Klein, ELLCIE Industries GmbH has established itself as a leader in advanced microscopy solutions for the most demanding applications in space exploration and defense technology.
Our state-of-the-art production facility in Grevesmühlen, Germany, combines German engineering precision with cutting-edge innovation to deliver unparalleled analytical capabilities.
World-class team of engineers and scientists specializing in vacuum technology and electron microscopy.
Continuous R&D to push the boundaries of non-destructive testing and materials analysis.
Am Industriepark 2-10
23936 Grevesmühlen, Germany
+49 (0) 123 456 789
info@ellcie-industries.com